What is Chemical Vapor Deposition?

Synthesis of thin films using the technique chemical vapor deposition (CVD) is a research area having a strong international position and has been ongoing at the inorganic chemistry program at the department of chemistry, Uppsala University since the 1970s.

CVD is a technique where a solid material is deposited on a usually heated surface as a thin film. Examples on applications are within electronics and wear resistant hard films. Swedish industry is today world leaders in the field of thin hard and wear resistant films.

Project Groups
  • Uppsala University
  • Chalmers
  • Royal Institute of Technology
  • Sandvik Coromant
  • Seco Tools

The people in CVD 2.0

The research will be conducted together with groups from Chalmers, The Royal Institute of Technology, Sandvik Coromant AB and Seco Tools AB in the form of a consortium named CVD 2.0.

The consortium will also be conducted together with several thin film groups at the Angstrom laboratory, including the PVD group at inorganic chemistry directed by Ulf Jansson (program responsible for the inorganic chemistry program).

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