Chemical Vapor Deposition
CVD 2.0 is a consortium that is focusing on developing and researching new techniques witihin Chemical Vapor Deposition-research.
Our main partner, the Swedish Foundation for Strategic Research made this consortium possible.
What is Chemical Vapor Deposition?
Synthesis of thin films using the technique Chemical Vapor Deposition (CVD) is a research area having a strong international position and has been ongoing at the Inorganic Chemistry program at the department of chemistry, Uppsala University since the 1970s. CVD is a technique where a solid material is deposited on a usually heated surface as a thin film.
Examples on applications are within electronics and wear resistant hard films. Swedish industry is today world leaders in the field of thin hard and wear resistant films.
CVD 2.0 is a consortium that is focusing on developing and researching new techniques witihin Chemical Vapor Deposition-research. Below you will see the different institutions and companies involved in the consortium.
